Fabrication of monocrystalline silicon x-ray mirrors
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Date
2019-09-09
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Citation of Original Publication
Raul E. Riveros, Michael P. Biskach, Kim D. Allgood, John D. Kearney, Michal Hlinka, Ai Numata, and William W. Zhang "Fabrication of monocrystalline silicon x-ray mirrors", Proc. SPIE 11119, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX, 1111908 (9 September 2019); https://doi.org/10.1117/12.2530343
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Copyright 2019 Society of Photo Optical Instrumentation Engineers (SPIE). ©2019 Society of Photo-Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Copyright 2019 Society of Photo Optical Instrumentation Engineers (SPIE). ©2019 Society of Photo-Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Abstract
Progress within the field of x-ray astronomy depends on astronomical x-ray observations of ever-increasing quality and speed. Fast and high-resolution x-ray observations over a broad spectral range promise amazing new discoveries. These observations, however, require a spaceborne x-ray telescope of unprecedented imaging power. Of the numerous technological concerns associated with the design and construction of such a telescope, the x-ray focusing optics present a particularly complex and arduous set of challenges. An x-ray optical assembly comprises many thousands of x-ray mirrors, a most critical element.
Our group at NASA Goddard Space Flight Center (GSFC) pursues the development of an x-ray mirror manufacturing process capable of meeting the stringent quality, production time, and cost requirements of the next-generation of x-ray telescopes. The manufacturing process employs monocrystalline silicon: a lightweight, stiff, thermally conductive, and readily available material which is free of internal stress; it is a nearly ideal material for a thin mirror substrate. The process involves various traditional optical fabrication techniques adapted to x-ray mirror geometry. Presently, our process is capable of fabricating sub-arcsecond half-powerdiameter (HPD) resolution mirror pairs (primary and secondary) at a mirror thickness of 0.5 mm and of virtually any x-ray optical design (e.g. Wolter-I, Wolter-Schwarzschild, etc.). The mirror substrate surface quality is comparable to, and sometimes exceeding, that of the mirrors on the Chandra X-ray Observatory. This paper describes the various manufacturing steps involved in the production of x-ray mirror substrates and a present status report.