UV-SERS Assisted by Nano-Focusing in Plasmonic Gratings with Tapered Slits

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dc.contributor.authorD’Aguanno, G.
dc.contributor.authorMattiucci, N.
dc.contributor.authorButun, S.
dc.contributor.authorCallahan, J. M.
dc.contributor.authorEveritt, H. O.
dc.contributor.authorAydin, K.
dc.contributor.authorBloemer, M.J.
dc.date.accessioned2020-05-13T17:56:00Z
dc.date.available2020-05-13T17:56:00Z
dc.date.issued2012
dc.descriptionFrontiers in Optics 2012, Rochester, New York United States, 14–18 October 2012en_US
dc.description.abstractThe potential for UV-SERS is demonstrated using subwavelength Al gratings grown on sapphire substrate. The role played by the slit geometry and analyte coverage is explored, demonstrating that enhancement factors greater than 100,000 are possible.en_US
dc.description.urihttps://www.osapublishing.org/abstract.cfm?uri=FiO-2012-FTu3A.68en_US
dc.format.extent2 pagesen_US
dc.genreconference papers and proceedingsen_US
dc.identifierdoi:10.13016/m2lzw1-tq81
dc.identifier.citationD’Aguanno, G.; et al.; UV-SERS Assisted by Nano-Focusing in Plasmonic Gratings with Tapered Slits; Frontiers in Optics 2012/Laser Science XXVIII OSA Technical Digest (online) (Optical Society of America, 2012), paper FTu3A.68 ; https://www.osapublishing.org/abstract.cfm?uri=FiO-2012-FTu3A.68en_US
dc.identifier.urihttps://doi.org/10.1364/FIO.2012.FTu3A.68
dc.identifier.urihttp://hdl.handle.net/11603/18617
dc.language.isoen_USen_US
dc.publisherOSA Publishingen_US
dc.relation.isAvailableAtThe University of Maryland, Baltimore County (UMBC)
dc.relation.ispartofUMBC Computer Science and Electrical Engineering Department Collection
dc.rightsThis item is likely protected under Title 17 of the U.S. Copyright Law. Unless on a Creative Commons license, for uses protected by Copyright Law, contact the copyright holder or the author.
dc.rightsPublic Domain Mark 1.0*
dc.rightsThis work was written as part of one of the author's official duties as an Employee of the United States Government and is therefore a work of the United States Government. In accordance with 17 U.S.C. 105, no copyright protection is available for such works under U.S. Law.
dc.rights.urihttp://creativecommons.org/publicdomain/mark/1.0/*
dc.titleUV-SERS Assisted by Nano-Focusing in Plasmonic Gratings with Tapered Slitsen_US
dc.typeTexten_US

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