Large Third-Order Nonlinearities in Atomic Layer Deposition Grown Nitrogen-Enriched TiO₂ Nanoscale Films
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2020-08
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Citation of Original Publication
R. Kuis, T. Gougousi, I. Basaldua, P. Burkins, J. A. Kropp and A. M. Johnson, "Large Third-Order Nonlinearities in Atomic Layer Deposition Grown Nitrogen-Enriched TiO2 Nanoscale Films," 2020 IEEE Research and Applications of Photonics in Defense Conference (RAPID), Miramar Beach, FL, USA, 2020, pp. 1-2, doi: 10.1109/RAPID49481.2020.9195674.
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© 2020 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
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Abstract
Nonlinear refractive index, n₂, values as high as 1±.1x10⁻⁹ cm² /W were measured in atomic layer deposition (ALD) grown TiO₂ nanoscale films, using femtosecond thermally managed Z-scan. The several order of magnitude increase in n₂ is believed due to the incorporation of nitrogen during growth.