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Initial HfO2 Growth on Si(100) and GaAs(100) Substrates using TEMAH+H2O and TDMAH+H2O ALD Processes
Atomic layer deposition (ALD) is a cyclic growth process that is distinguished by a self-limiting, two-step surface reaction that results in precise growth control and high quality, conformal thin films. Due to the ...
Selective Deposition of Metal Oxide Thin Films on Silicon Using Self-Assembled Monolayer Resists
Self-assembly refers to the organization of similar components in an ordered fashion, without manual manipulation. Octadecyltrichlorosilane (OTS) (CH3(CH2)17SiCl3) is a type of self-assembling molecule that when adsorbed ...
Transverse Correlation in Entangled Photons and Light-Matter Interaction
In recent years, quantum entanglement has attracted much; attention, because its unique properties provide potential; applications, which could not be achieved using conventional; techniques, such as quantum computing, ...