Now showing items 1-1 of 1
Atomic Layer Deposition of TiO2 on Si and GaAs Substrates Using TDMATi and H2O Precursors
Atomic layer deposition involving TDMATi and H<sub>2 sors is used to grow TiO<sub>2 lms in a homemade hot-wall, flowtube reactor. Process optimization and film properties are studied for films grown on Si substrates. ...