Towards Non-Degenerate Quantum Lithography
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Zhou, Yu, Tao Peng, Hui Chen, Jianbin Liu, and Yanhua Shih. “Towards Non-Degenerate Quantum Lithography.” Applied Sciences 8, no. 8 (2018): 8. https://doi.org/10.3390/app8081292.
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Abstract
The photonic de Broglie wavelength of a non-degenerate entangled photon pair is measured by using a Young’s double slit interferometer, which proves that the non-degenerate entangled photon pairs have the potential to be used in quantum lithography. Experimental results show that the de Broglie wavelength of non-degenerate biphotons is well defined and its wavelength is neither the wavelength of the signal photon, nor the wavelength of the idler photon. According to the de Broglie equation, its wavelength corresponds to the momentum of the biphoton, which equals the sum of the momenta of signal and idler photons. The non-degenerate ghost interference/diffraction is also observed in these experiments.