Engineering of Large Third-Order Nonlinearities in Atomic Layer Deposition Grown Nitrogen-Enriched TiO₂

dc.contributor.authorKuis, Robinson
dc.contributor.authorGougousi, Theodosia
dc.contributor.authorBasaldua, Isaac
dc.contributor.authorBurkins, Paul
dc.contributor.authorKropp, Jaron A.
dc.contributor.authorJohnson, Anthony M.
dc.date.accessioned2019-12-17T16:08:44Z
dc.date.available2019-12-17T16:08:44Z
dc.date.issued2019-10-17
dc.description.abstractThe third-order nonlinear optical properties of Nitrogen-enriched TiO₂ films deposited by Atomic Layer Deposition (ALD) at a temperature between 100 – 300°C on quartz substrates were studied using thermally managed Z-scan technique. TiO₂ oxide films prepared by Physical Vapor Deposition (PVD) at room temperature were used as control samples. The as-grown ALD films deposited at 150 – 300°C exhibited values for the nonlinear index of refraction, n₂, between 0.6x10ˉ¹¹ and 1x10ˉ⁹ cm²/W, which is 4–6 order larger than previously reported. Annealing the films, for 3 hours at 450°C in air, reduced the nonlinearities below the detection limit of the experimental setup. Similarly, as-grown 100°C ALD and PVD films did not produce a discernible Zscan trace. Composition analysis performed by x-ray photoelectrons spectroscopy (XPS) reveals the presence of Ti-O-N metallic bonds in the films that showed high nonlinear optical response. The presence of the metallic bonding gives the films deposited on Si (100) a golden color. These results demonstrate the possibility of a new class of thin-film nonlinear materials that their properties can be tailored by controlling the film composition.en_US
dc.description.sponsorshipWe thank the UMBC START program for providing seed funding. We thank Dr. Lisa Kelly, Dr. Brad Arnold, and Ms. Stacey Sova from the Department of Chemistry & Biochemistry (UMBC) for their assistance in obtaining the transmission data of the films, and Dr. Karen Gaskell at the University of Maryland for taking the XPS data. This material is based upon work supported by the National Science Foundation under grants ECCS-1407677 and DMR-1905305.en_US
dc.description.urihttps://pubs.acs.org/doi/full/10.1021/acsphotonics.9b01176en_US
dc.format.extent2 filesen_US
dc.genrejournal articles postprintsen_US
dc.identifierdoi:10.13016/m2rri9-tdba
dc.identifier.citationKuis, Robinson; Gougousi, Theodosia; Basaldua, Isaac; Burkins, Paul; Kropp, Jaron A.; Johnson, Anthony M.; Engineering of Large Third-Order Nonlinearities in Atomic Layer Deposition Grown Nitrogen-Enriched TiO₂; ACS Photonics 6, 11, 2966-2973 (2019); https://pubs.acs.org/doi/full/10.1021/acsphotonics.9b01176en_US
dc.identifier.urihttps://doi.org/10.1021/acsphotonics.9b01176
dc.identifier.urihttp://hdl.handle.net/11603/16718
dc.language.isoen_USen_US
dc.publisherACS Publicationsen_US
dc.relation.isAvailableAtThe University of Maryland, Baltimore County (UMBC)
dc.relation.ispartofUMBC Center for Advanced Photonics Rsearch (CASPR)
dc.relation.ispartofUMBC Student Collection
dc.relation.ispartofUMBC Physics Department
dc.relation.ispartofUMBC Computer Science and Electrical Engineering Department
dc.relation.ispartofUMBC Faculty Collection
dc.rightsThis item is likely protected under Title 17 of the U.S. Copyright Law. Unless on a Creative Commons license, for uses protected by Copyright Law, contact the copyright holder or the author.
dc.rightsThis document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Photonics, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/10.1021/acsphotonics.9b01176.
dc.rightsAccess to this item will begin on 2020-10-17
dc.subjectnanophotonicsen_US
dc.subjectnonlinear opticsen_US
dc.subjectthermally managed Z-scanen_US
dc.subjectTiO₂ filmen_US
dc.subjectatomic layer depositionen_US
dc.subjectCMOS compatible filmsen_US
dc.titleEngineering of Large Third-Order Nonlinearities in Atomic Layer Deposition Grown Nitrogen-Enriched TiO₂en_US
dc.typeTexten_US

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