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    Selective Deposition of Metal Oxide Thin Films on Silicon Using Self-Assembled Monolayer Resists

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    146.pdf (5.615Mb)
    Permanent Link
    http://hdl.handle.net/11603/1073
    Collections
    • UMBC Graduate School
    • UMBC Physics Department
    • UMBC Student Collection
    • UMBC Theses and Dissertations
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    Author/Creator
    Link, Daniel Oscar
    Date
    2008-02-12
    Type of Work
    application/pdf
    Text
    theses
    Department
    Physics
    Program
    Physics, Applied
    Rights
    This item may be protected under Title 17 of the U.S. Copyright Law. It is made available by UMBC for non-commercial research and education. For permission to publish or reproduce, please see http://aok.lib.umbc.edu/specoll/repro.php or contact Special Collections at speccoll(at)umbc.edu.
    Access limited to the UMBC community. Item may possibly be obtained via Interlibrary Loan through a local library, pending author/copyright holder's permission.
    Subjects
    Self-Assembly
    Thin Films
    Nanostructures
    Nanotemplates
    Physics, General (0605)
    Abstract
    Self-assembly refers to the organization of similar components in an ordered fashion, without manual manipulation. Octadecyltrichlorosilane (OTS) (CH3(CH2)17SiCl3) is a type of self-assembling molecule that when adsorbed onto a surface, assembles itself into a close-packed monolayer. The formation of the OTS monolayer on a silicon oxide surface causes a change in the hydrophobicity of the surface and is typically measured using water contact angle measurements. The presence of these molecules can also be monitored using FTIR spectroscopy due to the abundance of C-H bonds. A calibration standard has been found to relate the two measurement techniques as they pertain to this application. The ability of OTS to alter surface chemistry has also allowed us to use it as a resist for the atomic layer deposition (ALD) of metal-oxide thin films. We also investigate the formation of metal-oxide nanostructures using supercritical carbon dioxide assisted deposition (sc CO2) in nanotemplates and how the application of self-assembled monolayer resists can aid in nanostructure production.


    Albin O. Kuhn Library & Gallery
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    www.umbc.edu/scholarworks

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    Albin O. Kuhn Library & Gallery
    University of Maryland, Baltimore County
    1000 Hilltop Circle
    Baltimore, MD 21250
    www.umbc.edu/scholarworks

    Contact information:
    Email: scholarworks-group@umbc.edu
    Phone: 410-455-3544


    If you wish to submit a copyright complaint or withdrawal request, please email mdsoar-help@umd.edu.