Deep-UV standoff Raman spectroscopy

dc.contributor.authorArnold, Bradley
dc.contributor.authorBowman, Eric
dc.contributor.authorScheurer, Leslie
dc.date.accessioned2019-10-03T14:43:41Z
dc.date.available2019-10-03T14:43:41Z
dc.date.issued2019-05-13
dc.descriptionSPIE Defense + Commercial Sensing, 2019, Baltimore, Maryland, United States.en_US
dc.description.abstractThe availability of high peak-power laser systems capable of delivering intense deep-UV pulses has brought renewed interest in using Raman spectroscopy as both a selective and sensitive analytical technique for stand-off detection. Our approach uses a high power pulsed-laser as the excitation source, specifically the fourth and fifth harmonics of a Nd:YAG laser. One of the hurdles to be overcome to allow deep-UV Raman spectroscopy to become accessible is a direct method of calibrating both the observation frequency and detector response of the spectrograph being used. This report outlines our efforts to understand the photochemical and photophysical consequences of high-peak power excitation of cyclohexane for potential use as a secondary Raman standard in the deep-UV. Evaluation of the photochemical stability, both from multi-photon absorption and in the presence or absence of dissolved oxygen as well as the possibility of (near) resonance enhancement of the C-H stretching region will be described.en_US
dc.description.sponsorshipThe authors wish to acknowledge support of this work through a UMBC/ARL CRADA under ARL ECBC JSW 1410C for work completed at UMBC. L.S. is grateful for support obtained through the National Science Foundation Research Experience for Undergraduates (NSF REU) Award No. CHE-1460653.en_US
dc.description.urihttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/10983/109830H/Deep-UV-standoff-Raman-spectroscopy/10.1117/12.2519033.fullen_US
dc.format.extent9 pagesen_US
dc.genreconference papers and proceedingsen_US
dc.identifierdoi:10.13016/m2upzj-nz8k
dc.identifier.citationBradley R. Arnold, Eric Bowman, and Leslie Scheurer "Deep-UV standoff Raman spectroscopy", Proc. SPIE 10983, Next-Generation Spectroscopic Technologies XII, 109830H (13 May 2019); https://doi.org/10.1117/12.2519033en_US
dc.identifier.urihttps://doi.org/10.1117/12.2519033
dc.identifier.urihttp://hdl.handle.net/11603/14967
dc.language.isoen_USen_US
dc.publisherSPIEen_US
dc.relation.isAvailableAtThe University of Maryland, Baltimore County (UMBC)
dc.relation.ispartofUMBC Chemical, Biochemical & Environmental Engineering Department Collection
dc.relation.ispartofUMBC Faculty Collection
dc.relation.ispartofUMBC Student Collection
dc.rightsThis item is likely protected under Title 17 of the U.S. Copyright Law. Unless on a Creative Commons license, for uses protected by Copyright Law, contact the copyright holder or the author.
dc.rights© 2019 Society of Photo-Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
dc.subjectcyclohexaneen_US
dc.subjectRaman calibrationen_US
dc.subjectsecondary standarden_US
dc.subjectresonance enhancementen_US
dc.subjectspectral simulationen_US
dc.titleDeep-UV standoff Raman spectroscopyen_US
dc.typeTexten_US

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