Two-Photon Diffraction and Quantum Lithography

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PhysRevLett.87.013602.pdf (245.09 KB)

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https://link.aps.org/doi/10.1103/PhysRevLett.87.013602

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https://doi.org/10.1103/PhysRevLett.87.013602
 http://hdl.handle.net/11603/39876

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UMBC Faculty Collection
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Author/Creator ORCID

https://orcid.org/0000-0002-8206-3982
 https://orcid.org/0000-0002-3399-2101

Date

2001-06-14

Type of Work

journal articles
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Program

Citation of Original Publication

D’Angelo, Milena, Maria V. Chekhova, and Yanhua Shih. "Two-Photon Diffraction and Quantum Lithography". Physical Review Letters 87, no. 1 (2001): 013602. https://doi.org/10.1103/PhysRevLett.87.013602.

Rights

©2001 American Physical Society

Subjects

UMBC Quantum Optics Laboratory

Abstract

We report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have beaten the classical diffraction limit by a factor of 2. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.