Two-Photon Diffraction and Quantum Lithography

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dc.contributor.authorD’Angelo, Milena
dc.contributor.authorChekhova, Maria
dc.contributor.authorShih, Yanhua
dc.date.accessioned2025-08-28T16:10:01Z
dc.date.issued2001-06-14
dc.description.abstractWe report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have beaten the classical diffraction limit by a factor of 2. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.
dc.description.sponsorshipThis work was supported, in part, by ARDANSA, ONR, and NSF. M. V. C. acknowledges the support from the Russian Foundation for Basic Research, Grant No. 99-02-16419.
dc.description.urihttps://link.aps.org/doi/10.1103/PhysRevLett.87.013602
dc.format.extent4 pages
dc.genrejournal articles
dc.identifierdoi:10.13016/m2ibhj-taiq
dc.identifier.citationD’Angelo, Milena, Maria V. Chekhova, and Yanhua Shih. "Two-Photon Diffraction and Quantum Lithography". Physical Review Letters 87, no. 1 (2001): 013602. https://doi.org/10.1103/PhysRevLett.87.013602.
dc.identifier.urihttps://doi.org/10.1103/PhysRevLett.87.013602
dc.identifier.urihttp://hdl.handle.net/11603/39876
dc.language.isoen
dc.publisherAPS
dc.relation.isAvailableAtThe University of Maryland, Baltimore County (UMBC)
dc.relation.ispartofUMBC Faculty Collection
dc.relation.ispartofUMBC Student Collection
dc.relation.ispartofUMBC Physics Department
dc.rights©2001 American Physical Society
dc.subjectUMBC Quantum Optics Laboratory
dc.titleTwo-Photon Diffraction and Quantum Lithography
dc.typeText
dcterms.creatorhttps://orcid.org/0000-0002-8206-3982
dcterms.creatorhttps://orcid.org/0000-0002-3399-2101

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