Increased Laser Damage Threshold in As₂S₃ Motheye Antireflective Structures

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Increased_laser_damage_threshold.pdf (144.43 KB)

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https://opg.optica.org/abstract.cfm?uri=CLEO_AT-2014-JTh3J.4

Permanent Link

https://doi.org/10.1364/CLEO_AT.2014.JTh3J.4
 http://hdl.handle.net/11603/38833

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UMBC Faculty Collection
UMBC Computer Science and Electrical Engineering Department
UMBC Student Collection

Author/Creator

Author/Creator ORCID

https://orcid.org/0000-0003-0269-8433

Date

2014-06-08

Type of Work

conference papers and proceedings
Text

Department

Program

Citation of Original Publication

Weiblen, R. Joseph, Catalin Florea, Lynda Busse, Brandon Shaw, Curtis R. Menyuk, Ishwar Aggarwal, and Jasbinder Sanghera. “Increased Laser Damage Threshold in As₂S₃ Motheye Antireflective Structures.” In CLEO: 2014 (2014), Paper JTh3J.4, JTh3J.4. Optica Publishing Group, 2014. https://doi.org/10.1364/CLEO_AT.2014.JTh3J.4.

Rights

This work was written as part of one of the author's official duties as an Employee of the United States Government and is therefore a work of the United States Government. In accordance with 17 U.S.C. 105, no copyright protection is available for such works under U.S. Law.
Public Domain

Subjects

Laser induced damage thresholds
Fresnel reflection
Rigorous coupled wave analysis
UMBC Optical Fiber Communications Laboratory
UMBC High Performance Computing Facility (HPCF)
UMBC High Performance Computing Facility (HPCF)
Refractive index
UMBC Optical Fiber Communications Laboratory
Finite-difference time-domain method
Field enhancement

Abstract

We computationally study the irradiance enhancement in As₂S₃ motheye structures. We show that enhancement in the glass is minimal, matching with experiments showing an increased laser damage threshold for motheye structures versus thin-film AR coatings.