Design and fabrication of nano structures for Mid-IR antireflection surface texturing applications

dc.contributor.authorSood, Rachit M.
dc.contributor.authorNafisa, Fatima
dc.contributor.authorBamford, Douglas
dc.contributor.authorWoolf, David
dc.contributor.authorHensley, Joel
dc.contributor.authorSingh, Narsingh
dc.contributor.authorChoa, Fow-Sen
dc.date.accessioned2020-04-08T19:48:17Z
dc.date.available2020-04-08T19:48:17Z
dc.date.issued2020-02-28
dc.descriptionProceedings Volume 11292, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII; 112921F (2020) Event: SPIE OPTO, 2020, San Francisco, California, United Statesen_US
dc.description.abstractReduction of unwanted light reflection from a surface of a substance is very essential for the improvement of the performance of optical and photonic devices. Anti-reflection (AR) surface textures can be created on the surface of lenses and other optical elements to reduce the intensity of surface reflections. AR textures are indispens able in numerous applications, both low and high power, and are increasingly demanded on highly curved optical components. Nanofabrication involves the fabrication of devices at the nanometer scale. In this work, we used nanofabrication to design and fabricate nanostructures of squares and hexagons of different spatial pitch and gap width in Gallium Arsenide (GaAs). These structures have a gap of 300nm, 400nm, and pitch of 900nm, 1000nm and 1100nm. The fabrication process involves solvent cleaning, deposition of silicon oxide, soft and hard bake, photolithography and development. Both wet and dry etching were used to fabricate the expected structures. Results from scanning electron microscopy (SEM) to examine the shapes of the fabricated arrays are presented in this study. By combining dry and wet etches, we obtained the desired shapes and depth of hexagons and squares with rounded edges. We report detailed fabrication processes and their corresponding results at each step.en_US
dc.description.urihttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/11292/112921F/Design-and-fabrication-of-nano-structures-for-Mid-IR-antireflection/10.1117/12.2548392.shorten_US
dc.format.extent10 pagesen_US
dc.genreconference papers and proceedingsen_US
dc.identifierdoi:10.13016/m28wqn-tmk0
dc.identifier.citationSood, Rachit M.; Nafisa, Fatimal; Bamford, Douglas; Woolf, David; Hensley, Joel; Singh, Narsingh; Choa, Fow-Sen; Design and fabrication of nano structures for Mid-IR antireflection surface texturing applications; Proceedings Volume 11292, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII; 112921F (2020); https://www.spiedigitallibrary.org/conference-proceedings-of-spie/11292/112921F/Design-and-fabrication-of-nano-structures-for-Mid-IR-antireflection/10.1117/12.2548392.shorten_US
dc.identifier.urihttps://doi.org/10.1117/12.2548392
dc.identifier.urihttp://hdl.handle.net/11603/17894
dc.language.isoen_USen_US
dc.publisherSPIEen_US
dc.relation.isAvailableAtThe University of Maryland, Baltimore County (UMBC)
dc.relation.ispartofUMBC Chemistry & Biochemistry Department Collection
dc.relation.ispartofUMBC Computer Science and Electrical Engineering Department
dc.relation.ispartofUMBC Student Collection
dc.relation.ispartofUMBC Faculty Collection
dc.rightsThis item is likely protected under Title 17 of the U.S. Copyright Law. Unless on a Creative Commons license, for uses protected by Copyright Law, contact the copyright holder or the author.
dc.rights©2020 Society of Photo-Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
dc.titleDesign and fabrication of nano structures for Mid-IR antireflection surface texturing applicationsen_US
dc.typeTexten_US

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